Steremat

Float Zone Furnace FZ1520P

fz200 Crystal Growth System FZ 1520 for Float Zone Process Specially design as production equipment or for laboratories and institutes. The floating zone crystal growth system FZ 1520 can be used for cleaning processes under vacuum and for single crystal growth under inert gas (also dopant gases) up to pressure of 2 bars absolute. Its technical design (dimensioning) enables the use of rods with length of 1.500 mm and a maximum diameter of 8″ (pending on technology and power)

FZ 350

Crystal Growth System FZ 350 for Float Zone Process Specially design for laboratories, institutes and as testing unit for solar silicon. The floating zone crystal growth system FZ 350 can be used for cleaning processes under vacuum and for single crystal growth under inert gas (also dopant gases) up to pressure of 1,2 bars absolute. Its technical design (dimensioning, power) enables the use of rods with length of 320 mm and a maximum diameter of 2″.